KIMTECH Cleanroom Mask: Dual, Non-Adj, Polyethylene, White, M Mask Size, KIMTECH PURE
The KIMTECH PURE Cleanroom Mask: Dual is an ISO 3, Class 1 flat-fold mask in size M, made of white polyethylene with dual, non-adjustable headstraps and no nosepiece. Supplied in a 500-pack (MPN 62465), it is…
SKU 3G-OTH-695288
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Product Description
The KIMTECH PURE Cleanroom Mask: Dual is an ISO 3, Class 1 flat-fold mask in size M, made of white polyethylene with dual, non-adjustable headstraps and no nosepiece. Supplied in a 500-pack (MPN 62465), it is designed for controlled environments requiring strict particulate control.
Frequently Asked Questions
What is the KIMTECH PURE Cleanroom Mask 62465 used for?
The KIMTECH PURE Cleanroom Mask 62465 is used in ISO 3, Class 1 controlled environments to minimize particulate contamination. It is ideal for semiconductor, pharmaceutical, and biotechnology cleanrooms where strict particle control is required.
What are the specifications of the KIMTECH PURE Cleanroom Mask 62465?
This mask is a flat-fold, size M, made of white polyethylene with dual, non-adjustable headstraps and no nosepiece. It is supplied in a 500-pack (MPN 62465) and is rated for ISO 3, Class 1 environments.
Where to buy KIMTECH PURE Cleanroom Mask 62465 worldwide?
3G Electric supplies the KIMTECH PURE Cleanroom Mask 62465 worldwide. We handle full logistics, customs clearance, and delivery to your facility. Contact us for availability and lead time on this 500-pack cleanroom mask.
How to select the right KIMTECH PURE cleanroom mask size?
Selecting the right size ensures a secure fit and effective particulate control. The KIMTECH PURE mask 62465 is size M, suitable for average face dimensions. For proper sealing, ensure the dual headstraps are snug and the flat-fold shape covers nose and chin without gaps.
KIMTECH Products
3G Electric supplies KIMTECH iso 3, class 1 masks. We supply genuine products with in-stock availability on common SKUs, technical documentation, commissioning support, and warranty service — worldwide.
